| Customization: | Available |
|---|---|
| After-sales Service: | One Year |
| Warranty: | One Year |
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Lens of lithography machine
The high precision and high value lithography lens is one of the most expensive and complex core components in the lithography machine. Optical components in lithography are mainly used in exposure, illumination, energy detection, light path system and other scenes. The exposure system of lithography machine includes illumination system and projection objective lens. (1) High precision: in order to accurately image, strict control of aberrations, lithography lens flatness and finish requirements are extremely high (2) High value: ultra-high precision optical lens production, requires the highest precision grinding machine and the finest lens abrasive.
Material size
The lens is made of quartz, with an inner diameter of 11.1cm and an outer diameter of 14.8cm on plane A. B side inner diameter 12.2cm, outer diameter 14.4, side thickness 4.6cm, used in lithography machine precision components.
Quartz material with excellent physical and chemical properties is an essential key material in the field of high-end technology:
• Good light transmission;
• Low expansion coefficient;
• High temperature resistance;
• Good chemical stability;
• Good electrical insulation
Ultrasonic induced quartz material homogenization technology: high uniformity, low stress.
Field of application
As the core component of lithography machine, mainly used in semiconductor, biomedicine, photonics, nano devices
Principle of operation
It is mainly based on optical projection technology. It projects light onto the surface of a silicon wafer by placing the light source at a high focus through a specially designed lens system. The silicon wafer is coated with photoresist, and the exposure and development process of the photoresist will form the desired circuit pattern. To achieve higher resolution and higher pattern transfer, a number of key technologies are employed in lithography machines. The lens system consists of multiple lenses used to focus light onto a silicon wafer to form a pattern. A high resolution lens system needs to have smaller aberrations, larger field of view and higher optical transmittance. In recent years, with the development of nanotechnology, transmission lithography has been gradually replaced by exposure lithography with more complex lens systems.
| A | B | |||
| inner diameter | external diameter | inner diameter | external diameter | thickness |
| 11.1 | 14.8 | 12.2 | 14.4 | 4.6 |
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