Mirror for Lithography Machine

Product Details
Customization: Available
After-sales Service: One Year
Warranty: One Year

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Registered Capital
11600000 RMB
Plant Area
>2000 square meters
  • Mirror for Lithography Machine
  • Mirror for Lithography Machine
  • Mirror for Lithography Machine
  • Mirror for Lithography Machine
  • Mirror for Lithography Machine
  • Mirror for Lithography Machine
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Basic Info.

Model NO.
Mirror NO4
Usage
Lighting, Medical, Optical, Photography
Type
Convex Lens
Transmittance
>95%
Shape
Single-lens
Material
Microcrystal
Lenses Color
Brown
Certification
RoHS, ISO9001, CE
Customized
Non-Customized
Coating
UV
Light Transmission;
Good
Lithography Machine
Low
Precision
High
Chemical Stability
Good
Electrical Insulation
Good
Value
High
Transport Package
Pallet
Specification
microcrystal
Trademark
raytek
Origin
China

Product Description

Mirror for lithography machine

 

Optical components in lithography are mainly used in exposure, illumination, energy detection, light path system and other scenes. The exposure system of lithography machine includes illumination system and projection objective lens. (1) High precision: in order to accurately image, strict control of aberrations, lithography lens flatness and finish requirements are high (2) high value: high precision optical lens production, requires high precision grinding machine and fine lens abrasives.

 

Material size

 

The lens is made of microcrystalline material with inner diameter of 9.6cm and outer diameter of 19.4cm on plane A. The side thickness is 5.1cm, applied to the precision parts of the lithography machine.

 

Field of application

 

As the core component of lithography machine, mainly used in semiconductor, biomedicine, photonics, nano devices

 

Principle of operation

 

It is mainly based on optical projection technology. It projects light onto the surface of a silicon wafer by placing the light source at a high focus through a specially designed lens system. The silicon wafer is coated with photoresist, and the exposure and development process of the photoresist will form the desired circuit pattern. In order to achieve high resolution and high pattern transfer, the lithography machine employs many key technologies. The lens system consists of multiple lenses used to focus light onto a silicon wafer to form a pattern. A high resolution lens system needs to have smaller aberrations, larger field of view and higher optical transmittance. In recent years, with the development of nanotechnology, transmission lithography has been gradually replaced by exposure lithography with more complex lens systems.

 

A  
inner diameter external diameter thickness
9.6 19.4 5.1



Mirror for Lithography MachineMirror for Lithography MachineMirror for Lithography Machine

 

Mirror for Lithography MachineMirror for Lithography MachineMirror for Lithography Machine

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