Lens for Lithography Machine

Product Details
Customization: Available
After-sales Service: One Year
Warranty: One Year

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Registered Capital
11600000 RMB
Plant Area
>2000 square meters
  • Lens for Lithography Machine
  • Lens for Lithography Machine
  • Lens for Lithography Machine
  • Lens for Lithography Machine
  • Lens for Lithography Machine
  • Lens for Lithography Machine
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Basic Info.

Model NO.
Lens NO9
Type
Convex Lens
Transmittance
>95%
Shape
Single-lens
Material
Quartz
Lenses Color
Brown
Certification
RoHS, ISO9001, CE
Customized
Non-Customized
Coating
UV
Light Transmission;
Good
Lithography Machine
Low
Temperature Resistance
High
Chemical Stability
Good
Electrical Insulation
Good
Transport Package
Pallet
Specification
quartz
Trademark
raytek
Origin
China

Product Description

Lens for lithography machine

Optical components in lithography are mainly used in exposure, illumination, energy detection, light path system and other scenes. The exposure system of lithography machine includes illumination system and projection objective lens. (1) High precision: in order to accurately image, strict control of aberrations, lithography lens flatness and finish requirements are high (2) high value: high precision optical lens production, requires high precision grinding machine and fine lens abrasives.

 

 

Material size

The lens is quartz 4786 A face inner diameter 43.5cm, outer diameter 58cm. B side inner diameter 52cm, outer diameter 57.5 side thickness 2.5cm, used in precision parts of lithography machine.

Quartz material with excellent physical and chemical properties is an essential key material in the field of technology:

• Good light transmission;

• Low expansion coefficient;

• High temperature resistance;

• Good chemical stability;

• Good electrical insulation

Ultrasonic induced quartz material homogenization technology: high uniformity, low stress.

 

Field of application

As the core component of lithography machine, mainly used in semiconductor, biomedicine, photonics, nano devices

 

Principle of operation

It is mainly based on optical projection technology. It projects light onto the surface of a silicon wafer by placing the light source at a high focus through a specially designed lens system. The silicon wafer is coated with photoresist, and the exposure and development process of the photoresist will form the desired circuit pattern. To achieve higher resolution and higher pattern transfer, a number of key technologies are employed in lithography machines. The lens system consists of multiple lenses used to focus light onto a silicon wafer to form a pattern. A high resolution lens system needs to have smaller aberrations, larger field of view and higher optical transmittance. In recent years, with the development of nanotechnology, transmission lithography has been gradually replaced by exposure lithography with more complex lens systems.



Lens for Lithography Machine

A B  
inner diameter external diameter inner diameter external diameter thickness
43.5 58 52 57.5 2.5

 

Lens for Lithography MachineLens for Lithography MachineLens for Lithography MachineLens for Lithography Machine

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