| Customization: | Available |
|---|---|
| After-sales Service: | One Year |
| Warranty: | One Year |
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Optical glass for lithography machines
Optical components in lithography are mainly used in exposure, illumination, energy detection, light path system and other scenes. The exposure system of lithography machine includes illumination system and projection objective lens. (1) High precision: in order to accurately image, strict control of aberrations, lithography lens flatness and finish requirements are high (2) high value: high precision optical lens production, requires high precision grinding machine and fine lens abrasives.
Material size
The lens is optical glass 4786 A face, inner diameter 11.1cm, outer diameter 18.9cm. B side inner diameter 11.1, outer diameter 18.9 side thickness 1.4cm, used in precision parts of lithography machine.
Field of application
As the core component of lithography machine, mainly used in semiconductor, biomedicine, photonics, nano devices
Principle of operation
It is mainly based on optical projection technology. It projects light onto the surface of a silicon wafer by placing the light source at a high focus through a specially designed lens system. The silicon wafer is coated with photoresist, and the exposure and development process of the photoresist will form the desired circuit pattern. In order to achieve high resolution and high pattern transfer, the lithography machine employs many key technologies. The lens system consists of multiple lenses used to focus light onto a silicon wafer to form a pattern. A high resolution lens system needs to have smaller aberrations, larger field of view and higher optical transmittance. In recent years, with the development of nanotechnology, transmission lithography has been gradually replaced by exposure lithography with more complex lens systems.
| A | B | |||
| inner diameter | external diameter | inner diameter | external diameter | thickness |
| 11.1 | 18.9 | 11.1 | 18.9 | 1.4 |
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