Lithoshield Optiglass - High Temperature and Chemical Resistant Lens

Product Description

 

Lens of lithography machine

The high precision and high value lithography lens is one of the expensive and complex core components in the lithography machine. Optical components in lithography are mainly used in exposure, illumination, energy detection, light path system and other scenes. The exposure system of lithography machine includes illumination system and projection objective lens. (1) High precision: in order to accurately image, strict control of aberrations, lithography lens flatness and finish requirements are high (2) high value: high precision optical lens production, requires high precision grinding machine and fine lens abrasives.

 

Material size

The lens is made of quartz, with inner diameter of 8.1cm and outer diameter of 11.6cm in plane A. The inner diameter of the B side is 9.8cm, the outer diameter is 11.2, and the side thickness is 6.2cm. It is applied to the precision parts of the lithography machine.

Quartz material with excellent physical and chemical properties is an essential key material in the field of technology:

• Good light transmission;

• Low expansion coefficient;

• Good chemical stability;

• Good electrical insulation

Ultrasonic induced quartz material homogenization technology: high uniformity, low stress.

 

Field of application

As the core component of lithography machine, mainly used in semiconductor, biomedicine, photonics, nano devices

 

Principle of operation

It is mainly based on optical projection technology. It projects light onto the surface of a silicon wafer by placing the light source at a high focus through a specially designed lens system. The silicon wafer is coated with photoresist, and the exposure and development process of the photoresist will form the desired circuit pattern. To achieve higher resolution and higher pattern transfer, a number of key technologies are employed in lithography machines. The lens system consists of multiple lenses used to focus light onto a silicon wafer to form a pattern. A high resolution lens system needs to have smaller aberrations, larger field of view and higher optical transmittance. In recent years, with the development of nanotechnology, transmission lithography has been gradually replaced by exposure lithography with more complex lens systems.

 

A		B
inner diameter	external diameter	inner diameter	external diameter	thickness
8.1	11.6	9.8	11.2	6.2